Invention Grant
- Patent Title: Magnetic-field-generating apparatus for magnetron sputtering
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Application No.: US15547541Application Date: 2016-03-11
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Publication No.: US10280503B2Publication Date: 2019-05-07
- Inventor: Yoshihiko Kuriyama
- Applicant: HITACHI METALS, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI METALS, LTD.
- Current Assignee: HITACHI METALS, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2015-056455 20150319
- International Application: PCT/JP2016/057752 WO 20160311
- International Announcement: WO2016/148058 WO 20160922
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/35 ; H01J37/34

Abstract:
A racetrack-shaped apparatus for generating a magnetic field on a target surface for magnetron sputtering, comprising on a magnetic base (a) a vertically magnetized center permanent magnet arranged straight; (b) vertically magnetized peripheral permanent magnets surrounding the center permanent magnet; (c) vertically magnetized first intermediate permanent magnets, horizontally magnetized second intermediate permanent magnets and vertically magnetized third intermediate permanent magnets arranged on both sides of the center permanent magnet; and (d) vertically magnetized fourth intermediate permanent magnets arranged separately from both longitudinal ends of the center permanent magnet; each second intermediate permanent magnet being arranged with one magnetic pole opposing a near-target side surface portion of each first intermediate permanent magnet.
Public/Granted literature
- US20180023189A1 MAGNETIC-FIELD-GENERATING APPARATUS FOR MAGNETRON SPUTTERING Public/Granted day:2018-01-25
Information query
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