Invention Grant
- Patent Title: Semiconductor micro-analysis chip and method of manufacturing the same
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Application No.: US15408677Application Date: 2017-01-18
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Publication No.: US10281429B2Publication Date: 2019-05-07
- Inventor: Kentaro Kobayashi , Michihiko Nishigaki , Hiroshi Hamasaki , Naofumi Nakamura
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz & Volek PC
- Priority: JP2014-147613 20140718
- Main IPC: G01N27/447
- IPC: G01N27/447 ; G01N15/10

Abstract:
According to one embodiment, a semiconductor micro-analysis chip includes a first flow channel provided with a substrate surface, the flow channel engraved on the substrate into which a sample liquid can flow, micropore provided with a part of the flow channel, a reservoir provided with at least one end of the flow channel, the reservoir engraved on the substrate for inlet and outlet of the sample liquid, and a first electrode provided with a part of the flow channel or of the reservoir. The electrode is disposed from the bottom surface of the flow channel or of the reservoir to the substrate surface, and a side surface which connects the bottom surface and the substrate surface is tapered for reducing a bend in a height direction of the electrode.
Public/Granted literature
- US20170122905A1 SEMICONDUCTOR MICRO-ANALYSIS CHIP AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2017-05-04
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