- Patent Title: Diagnosing an abnormal state of a substrate-processing apparatus
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Application No.: US15399060Application Date: 2017-01-05
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Publication No.: US10281520B2Publication Date: 2019-05-07
- Inventor: Dae-Sung Jung , Sang-Yoon Soh , Jung-Hwan Um
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Onello & Mello, LLP
- Priority: KR10-2016-0110494 20160830
- Main IPC: G01R31/00
- IPC: G01R31/00 ; G01R31/28 ; G01N25/72 ; H01J37/32 ; H01L21/67 ; H01L21/687
Abstract:
A method of diagnosing an abnormal state of a substrate-processing apparatus includes measuring a temperature of a chuck in the substrate-processing apparatus. The temperature of the chuck is compared to a target temperature of the chuck, with a temperature-controlling unit. A control signal is analyzed to diagnose an abnormal state of the substrate-processing apparatus. The control signal is transmitted from the temperature-controlling unit to a drive parameter-applying unit configured to provide the chuck with a drive parameter.
Public/Granted literature
- US20180059168A1 DIAGNOSING AN ABNORMAL STATE OF A SUBSTRATE-PROCESSING APPARATUS Public/Granted day:2018-03-01
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