Invention Grant
- Patent Title: Resist composition and patterning process
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Application No.: US15696430Application Date: 2017-09-06
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Publication No.: US10281818B2Publication Date: 2019-05-07
- Inventor: Jun Hatakeyama
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2016-182952 20160920
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/038 ; H01L21/027 ; G03F7/16 ; G03F7/38 ; G03F7/20 ; G03F7/30
Abstract:
A resist composition comprising an alkali metal salt of tetraiodophenolphthalein, tetraiodophenolsulfonphthalein or tetraiodofluorescein exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
Public/Granted literature
- US20180081268A1 RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2018-03-22
Information query
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