An exposure apparatus includes a polarizing member polarizing illumination light, and a filter having at least one opening. The polarizing member includes a first polarizing unit and a second polarizing unit arranged so as to surround the first polarizing unit. The second polarizing unit is configured so as to polarize the illumination light entering the second polarizing unit in the circumferential direction along the outer circumference of the first polarizing unit. At least a portion of the first polarizing unit is configured to polarize the illumination light in the direction orthogonal to the polarization direction in a part of the second polarizing unit located on the side opposite to the central part of the first polarizing unit. The openings are arranged in the filter so that the illumination light at the post stage of the filter and the polarizing member includes the illumination light polarized by the first and second polarizing units.