Invention Grant
- Patent Title: Microlithography projection objective
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Application No.: US15414005Application Date: 2017-01-24
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Publication No.: US10281824B2Publication Date: 2019-05-07
- Inventor: Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B17/08
Abstract:
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
Public/Granted literature
- US20170192362A1 MICROLITHOGRAPHY PROJECTION OBJECTIVE Public/Granted day:2017-07-06
Information query
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