Invention Grant
- Patent Title: Exposure method
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Application No.: US15981272Application Date: 2018-05-16
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Publication No.: US10281828B2Publication Date: 2019-05-07
- Inventor: Kento Arimatsu
- Applicant: KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHO
- Applicant Address: JP Aichi
- Assignee: KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHO
- Current Assignee: KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHO
- Current Assignee Address: JP Aichi
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2017-100775 20170522
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00 ; G03B27/34 ; G03B27/53

Abstract:
An exposure method includes, in a case of exposing unmeasurable shots which are arranged linearly and whose focus value cannot be measured and a measurable shot which is adjacent to the unmeasurable shots and whose focus value can be measured, exposing alternately the measurable shot and the unmeasurable shots such that the unmeasurable shots are exposed using the focus value of the adjacent measurable shot exposed immediately before the unmeasurable shots.
Public/Granted literature
- US20180335688A1 EXPOSURE METHOD Public/Granted day:2018-11-22
Information query
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