The device for treating an object with plasma comprises a jacket apparatus (10) which forms, or can form, a substantially gas-tight holding chamber (15) in which an object (1) to be treated can be accommodated. The device comprises a first electrode (20) and a second electrode (21), wherein the two electrodes (20, 21) are arranged with reference to the jacket apparatus (10) such that a plasma (2) can be generated in the holding chamber (15) of the jacket apparatus (10). A wall (13) of the jacket apparatus (10) forming the holding chamber (15) of the jacket apparatus (10) has a modulus of elasticity of Ew