- Patent Title: Semiconductor memory device and method of manufacturing the same
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Application No.: US15703006Application Date: 2017-09-13
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Publication No.: US10283517B2Publication Date: 2019-05-07
- Inventor: Takuo Ohashi , Fumiki Aiso
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L27/11578
- IPC: H01L27/11578 ; H01L27/11582 ; H01L27/11563 ; H01L27/1157 ; H01L27/11514 ; H01L27/11551 ; H01L27/11524 ; H01L27/11556

Abstract:
According to an embodiment, a semiconductor memory device includes a plurality of control gate electrodes, a semiconductor layer, and a charge accumulation layer. The plurality of control gate electrodes are provided as a stack above a substrate. The semiconductor layer has as its longitudinal direction a direction perpendicular to the substrate, and faces the plurality of control gate electrodes. The charge accumulation layer is positioned between the control gate electrode and the semiconductor layer. A lower end of the charge accumulation layer is positioned more upwardly than a lower end of a lowermost layer-positioned one of the control gate electrodes.
Public/Granted literature
- US20180006053A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-01-04
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