Invention Grant
- Patent Title: Plasma spectroscopic analysis method and inhibitor of plasma emission derived from non-target
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Application No.: US15724970Application Date: 2017-10-04
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Publication No.: US10295471B2Publication Date: 2019-05-21
- Inventor: Tokuo Kasai
- Applicant: ARKRAY, Inc.
- Applicant Address: JP Kyoto
- Assignee: ARKRAY, Inc.
- Current Assignee: ARKRAY, Inc.
- Current Assignee Address: JP Kyoto
- Agency: Morgan, Lewis & Bockius LLP
- Priority: JP2016-199457 20161007; JP2017-180832 20170921
- Main IPC: G01N21/68
- IPC: G01N21/68 ; G01N33/493 ; G01N21/69 ; G01N1/40

Abstract:
A plasma spectroscopic analysis method includes a concentration process of concentrating a target in a sample, in the vicinity of one of a pair of electrodes in the presence of the sample; a plasma generation process of generating plasma in the sample by applying a voltage to the pair of electrodes; and a detection process of detecting emission of the target generated by the plasma, wherein the plasma generation process is performed in the presence of a defoaming agent.
Public/Granted literature
- US20180100803A1 Plasma Spectroscopic Analysis Method and Inhibitor of Plasma Emission Derived from Non-Target Public/Granted day:2018-04-12
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