Invention Grant
- Patent Title: Semiconductor device and method for manufacturing semiconductor device
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Application No.: US16017344Application Date: 2018-06-25
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Publication No.: US10297490B2Publication Date: 2019-05-21
- Inventor: Taichi Karino
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki
- Priority: JP2017-153887 20170809
- Main IPC: H01L23/525
- IPC: H01L23/525 ; H01L21/761 ; H01L23/62 ; H01L27/112

Abstract:
A semiconductor device includes a semiconductor substrate of a first conductivity type, a plurality of short-circuit prevention-regions of a second conductivity type at an upper portion of the semiconductor substrate, a first insulating film on a top surface of the semiconductor substrate, a strip-shaped fuse on a top surface of the first insulating film spanning over the short-circuit prevention-regions, a second insulating film on a top surface of the fuse, and a passivation film on a top surface of the second insulating film and having an opening for laser trimming. The opening exposes the second insulating film above an area including the short-circuit prevention-regions.
Public/Granted literature
- US20190051556A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2019-02-14
Information query
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