Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15225796Application Date: 2016-08-01
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Publication No.: US10297527B2Publication Date: 2019-05-21
- Inventor: Takashi Saito , Fumihiko Momose , Yoshitaka Nishimura , Eiji Mochizuki
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki-Shi, Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi, Kanagawa
- Agency: Rabin & Berdo, P.C.
- Priority: JP2015-183261 20150916
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L23/367 ; H01L23/373

Abstract:
A semiconductor device includes a radiation plate having a rear surface roughened by a plurality of dents that overlap with each other; a laminated substrate provided on a front surface of the radiation plate and including an insulating plate, a circuit board provided on a front surface of the insulating plate, and a metal plate provided on a rear surface of the insulating plate; a semiconductor chip provided on the circuit board; a radiator; and a heat radiating material retained between the rear surface of the radiation plats and the radiator. The plurality of dents that roughen the rear surface of the radiation plate provides the rear surface with an arithmetic average roughness ranging from 1 μm to 10 μm, and each of the dents has a maximum dent depth ranging from 12 μm to 71.5 μm, and a dent width ranging from 0.17 mm to 0.72 mm.
Public/Granted literature
- US20170077009A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-03-16
Information query
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