Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15915413Application Date: 2018-03-08
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Publication No.: US10297685B2Publication Date: 2019-05-21
- Inventor: Makoto Mizukami
- Applicant: Kabushiki Kaisha Toshiba , Toshiba Electronic Devices & Storage Corporation
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: White & Case LLP
- Priority: JP2017-180357 20170920
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/06 ; H01L29/16

Abstract:
According to an embodiment, a semiconductor device includes a first electrode, a second electrode, a first semiconductor region, a plurality of second semiconductor regions, a plurality of third semiconductor regions, a plurality of third electrodes, and a plurality of gate electrodes. The gate electrodes and the third electrodes are arranged parallel in a second direction and periodically with a third arrangement cycle such that the ratio of the number of the gate electrodes and the third electrodes in the first region is m3 to m4 (m3, m4 being positive integers and m3 being more than or equal to m4).
Public/Granted literature
- US20190088774A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-03-21
Information query
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