Invention Grant
- Patent Title: Composite spacer layer for magnetoresistive memory
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Application No.: US15339928Application Date: 2016-10-31
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Publication No.: US10297745B2Publication Date: 2019-05-21
- Inventor: Taiebeh Tahmasebi , Vinayak Bharat Naik , Kangho Lee , Chim Seng Seet , Kazutaka Yamane
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Current Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Current Assignee Address: SG Singapore
- Agency: Thompson Hine LLP
- Main IPC: H01L27/22
- IPC: H01L27/22 ; G11C11/15 ; H01L43/02 ; H01L43/08 ; H01L43/10 ; H01L43/12

Abstract:
A bottom pinned perpendicular magnetic tunnel junction (pMTJ) with high TMR which can withstand high temperature back-end-of-line (BEOL) processing is disclosed. The pMTJ includes a composite spacer layer between a SAF layer and a reference layer of the fixed magnetic layer of the pMTJ. The composite spacer layer includes a first non-magnetic (NM) spacer layer, a magnetic (M) spacer layer disposed over the first NM spacer layer and a second NM spacer layer disposed over the M layer. The M layer is a magnetically continuous amorphous layer, which provides a good template for the reference layer.
Public/Granted literature
- US20170125664A1 SPACER LAYER FOR MAGNETORESISTIVE MEMORY Public/Granted day:2017-05-04
Information query
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