Invention Grant
- Patent Title: Method for manufacturing display device
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Application No.: US15911311Application Date: 2018-03-05
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Publication No.: US10297797B2Publication Date: 2019-05-21
- Inventor: Naomu Kitano , Keisuke Ono
- Applicant: Japan Display Inc.
- Applicant Address: JP Tokyo
- Assignee: Japan Display Inc.
- Current Assignee: Japan Display Inc.
- Current Assignee Address: JP Tokyo
- Agency: Typha IP LLC
- Priority: JP2017-043717 20170308
- Main IPC: H01L51/56
- IPC: H01L51/56 ; H01L51/00 ; H01L51/52 ; H01L27/32

Abstract:
A method for manufacturing a display device includes forming an insulating layer embedding a transistor arranged on a substrate, forming a first electrode electrically connected with the transistor above the insulating layer, forming a partition wall layer having an opening part covering a periphery edge part of the first electrode and exposing an inner side region of the first electrode, forming an organic layer including an organic electroluminescent material above the first electrode, forming a second electrode above the partition layer and the organic layer, and forming a sealing layer above the second electrode. Deposition of the second electrode includes a film deposition step of an electrode layer having a thinner film thickness than a target film thickness of the second electrode, and a waiting step after completion of the deposition step of the electrode layer.
Public/Granted literature
- US20180261803A1 METHOD FOR MANUFACTURING DISPLAY DEVICE Public/Granted day:2018-09-13
Information query
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