Halftone mask manufacturing method and halftone mask manufacturing system
Abstract:
A temporary dot pattern at a dot pattern determining target gradation is determined by adding or removing dots as much as the number of dots corresponding to a gradation difference to or from a dot pattern at a gradation at which a dot pattern is already determined, and a dot pattern at a dot pattern determining target gradation is determined by performing a replacement process of replacing dots including some of dots at a dot pattern determined gradation among the dots in the temporary dot pattern with non-dot arrangements. A halftone mask may be constituted by a group of dot patterns at each gradation, or the halftone mask may be constituted by setting a dot pattern for each gradation as a threshold value.
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