Invention Grant
- Patent Title: Halftone mask manufacturing method and halftone mask manufacturing system
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Application No.: US15993335Application Date: 2018-05-30
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Publication No.: US10298812B2Publication Date: 2019-05-21
- Inventor: Kimito Katsuyama
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2015-234980 20151201
- Main IPC: H04N1/405
- IPC: H04N1/405 ; H04N1/60 ; B41J2/52

Abstract:
A temporary dot pattern at a dot pattern determining target gradation is determined by adding or removing dots as much as the number of dots corresponding to a gradation difference to or from a dot pattern at a gradation at which a dot pattern is already determined, and a dot pattern at a dot pattern determining target gradation is determined by performing a replacement process of replacing dots including some of dots at a dot pattern determined gradation among the dots in the temporary dot pattern with non-dot arrangements. A halftone mask may be constituted by a group of dot patterns at each gradation, or the halftone mask may be constituted by setting a dot pattern for each gradation as a threshold value.
Public/Granted literature
- US20180352115A1 HALFTONE MASK MANUFACTURING METHOD AND HALFTONE MASK MANUFACTURING SYSTEM Public/Granted day:2018-12-06
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