Invention Grant
- Patent Title: Nozzle cleaning method and automated analyzer
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Application No.: US14916633Application Date: 2014-07-24
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Publication No.: US10307782B2Publication Date: 2019-06-04
- Inventor: Takushi Miyakawa , Yukinori Sakashita , Yoshihiro Yamashita , Katsuhiro Kambara
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2013-189092 20130912
- International Application: PCT/JP2014/069614 WO 20140724
- International Announcement: WO2015/037339 WO 20150319
- Main IPC: B05B12/12
- IPC: B05B12/12 ; B08B9/023 ; B08B9/032 ; B05B15/531 ; B05B15/555 ; G01N35/10 ; G01N35/04

Abstract:
The nozzle cleaning method includes the following steps: a first cleaning step in which a pre-pressurization liquid is discharged from a dispensing nozzle in a first cleaning position so as to clean the inside wall thereof and a first cleaning liquid is applied to the outside wall of the dispensing nozzle so as to clean said outside wall; a second cleaning step in which a second cleaning liquid is suctioned into the dispensing nozzle in a second cleaning position so as to clean the inside wall thereof; and a third cleaning step in which the second cleaning liquid is discharged from the dispensing nozzle in a third cleaning position so as to clean the inside wall thereof and a third cleaning liquid is applied to the outside wall of the dispensing nozzle so as to clean said outside wall.
Public/Granted literature
- US20160193622A1 NOZZLE CLEANING METHOD AND AUTOMATED ANALYZER Public/Granted day:2016-07-07
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