Invention Grant
- Patent Title: Cleaning device for cleaning electroplating substrate holder
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Application No.: US14839625Application Date: 2015-08-28
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Publication No.: US10307798B2Publication Date: 2019-06-04
- Inventor: Yu-Young Wang , Chung-En Kao , Victor Y. Lu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTER MANUFACTURING COMPANY LIMITED
- Current Assignee: TAIWAN SEMICONDUCTER MANUFACTURING COMPANY LIMITED
- Current Assignee Address: TW Hsin-Chu
- Agency: Cooper Legal Group, LLC
- Main IPC: B08B3/02
- IPC: B08B3/02 ; B08B17/02 ; C25D21/08 ; C25D21/00 ; C25D17/06

Abstract:
A cleaning device for removing contamination on a substrate holder used with an electroplating cell includes an arm, a cleaning agent supplier, a nozzle and a receiver. The cleaning agent supplier is coupled to the arm and configured to supply a cleaning agent. The nozzle is coupled to the cleaning agent supplier and configured to spray the cleaning agent onto the substrate holder to remove the contamination. The receiver is coupled to the arm and configured to receive the cleaning agent after the cleaning agent is sprayed onto the substrate holder.
Public/Granted literature
- US20170056934A1 CLEANING DEVICE FOR CLEANING ELECTROPLATING SUBSTRATE HOLDER Public/Granted day:2017-03-02
Information query
IPC分类: