Invention Grant
- Patent Title: Liquid ejecting apparatus and cleaning apparatus
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Application No.: US15837771Application Date: 2017-12-11
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Publication No.: US10308027B2Publication Date: 2019-06-04
- Inventor: Chikashi Nakamura
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2016-249948 20161222
- Main IPC: B41J2/165
- IPC: B41J2/165

Abstract:
A liquid ejecting apparatus performs first contact of an absorption member with a nozzle surface in which nozzles for liquid ejection are arranged, and performs second contact of the absorption member with the nozzle surface after the first contact. Pressure applied to, of the nozzle surface, a nozzle neighborhood area (a nozzle peripheral area) including the nozzles due to contact of the absorption member in the first contact is lower than pressure applied to the nozzle neighborhood area (a nozzle peripheral area) due to contact of the absorption member in the second contact.
Public/Granted literature
- US20180178523A1 LIQUID EJECTING APPARATUS AND CLEANING APPARATUS Public/Granted day:2018-06-28
Information query
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