Invention Grant
- Patent Title: Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition
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Application No.: US14765090Application Date: 2014-01-31
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Publication No.: US10309010B2Publication Date: 2019-06-04
- Inventor: Satoko Gatineau , Changhee Ko , Jean-Marc Girard , Julien Gatineau
- Applicant: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude , Satoko Gatineau , Changhee Ko , Jean-Marc Girard , Julien Gatineau
- Applicant Address: FR Paris
- Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee Address: FR Paris
- Agent Patricia E. McQueeney; Allen E. White
- International Application: PCT/IB2014/058712 WO 20140131
- International Announcement: WO2014/118748 WO 20140807
- Main IPC: C23C16/06
- IPC: C23C16/06 ; C07F15/06 ; C23C16/18 ; C23C16/34 ; C23C16/40 ; C23C16/42 ; C23C16/455 ; C23C16/28 ; H01L21/285 ; H01L21/768
Abstract:
Cobalt-containing compounds, their synthesis, and their use for the deposition of cobalt containing films are disclosed. The disclosed cobalt-containing compounds have one of the following formulae: wherein each of R1, R2, R3, R4 and R5 is independently selected from the group consisting of hydrogen and linear, cyclic, or branched hydrocarbon groups; provided that (a) R1≠R2 and/or R3 when R1 and R2 and R3 are a hydrocarbon group; (b) R1 and R2 are a hydrocarbon group when R3 is H; or (c) R1 is a C2-C4 hydrocarbon group when R2 and R3 are H.
Public/Granted literature
- US20160010204A1 COBALT-CONTAINING COMPOUNDS, THEIR SYNTHESIS, AND USE IN COBALT-CONTAINING FILM DEPOSITION Public/Granted day:2016-01-14
Information query
IPC分类:
