Photoacid generators and lithographic resists comprising the same

Invention Grant

US10310375B2 Photoacid generators and lithographic resists comprising the same 有权

Patent Title: Photoacid generators and lithographic resists comprising the same
Application No.: US14219495

Application Date: 2014-03-19
Publication No.: US10310375B2

Publication Date: 2019-06-04
Inventor: Kenneth E Gonsalves , Mingxing Wang
Applicant: University Of North Carolina At Charlotte
Agency: Nexsen Pruet, PLLC
Agent J. Clinton Wimbish
Main IPC: G03F7/004
IPC: G03F7/004 ; C07C309/65 ; C07C309/67 ; C07C309/73 ; C07C309/75 ; C08F228/06 ; C07D333/46 ; C07C311/48 ; C07C381/12 ; G03F7/039 ; C07C303/38 ; G03F7/027

Abstract:

The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.

Public/Granted literature

Information query

Espacenet

IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/004	.感光材料（G03F7/12，G03F7/14优先）