Invention Grant
- Patent Title: Method for controlling the activity of at least two light radiation sources belonging to a stereolithography machine
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Application No.: US15329033Application Date: 2015-07-13
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Publication No.: US10310468B2Publication Date: 2019-06-04
- Inventor: Roberto Fortunato
- Applicant: DWS S.R.L.
- Applicant Address: IT Thiene
- Assignee: DWS S.R.L.
- Current Assignee: DWS S.R.L.
- Current Assignee Address: IT Thiene
- Agency: Husch Blackwell LLP
- Priority: ITVI2014A0199 20140730
- International Application: PCT/IB2015/055288 WO 20150713
- International Announcement: WO2016/016754 WO 20160204
- Main IPC: G05B19/042
- IPC: G05B19/042 ; B33Y50/02 ; B29C64/135 ; B29C64/153 ; B29C64/386

Abstract:
The invention is a method for controlling the activity of two light radiation sources (2, 3) belonging to a stereolithography machine (1) and suited to act at the level of a portion (104) of a superimposition area (101) defined on the work surface (100) of the stereolithography machine (1) for the production of a three-dimensional object (200) through stereolithography. For each one of the lines (210) with generic length L that define each layer (201) of the three-dimensional object (200) within the portion (104), the method provides for activating: a first light radiation source (2) for a first section (211) of the line (210) having length X; a second light radiation source (3) for the remaining second section (212) of the line (210) having length Y, wherein the value X of the first section (211) is selected within the interval 0
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