Invention Grant
- Patent Title: Alternating hardmasks for tight-pitch line formation
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Application No.: US15445112Application Date: 2017-02-28
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Publication No.: US10312103B2Publication Date: 2019-06-04
- Inventor: Sean D. Burns , Nelson M. Felix , Chi-Chun Liu , Yann A. M. Mignot , Stuart A. Sieg
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Tutunjian & Bitetto, P.C.
- Agent Vazken Alexanian
- Main IPC: H01L21/308
- IPC: H01L21/308 ; H01L21/3065 ; H01L29/66

Abstract:
A method for forming fins includes forming a three-color hardmask fin pattern on a fin base layer. The three-color hardmask fin pattern has hardmask fins of three mutually selectively etchable compositions. A region on the three-color hardmask fin pattern is masked, leaving one or more fins of a first color exposed. All exposed fins of the first color are etched away with a selective etch that does not remove fins of a second color or a third color. The mask and all fins of a second color are etched away. Fins are etched into the fin base layer by anisotropically etching around remaining fins of the first color and fins of the third color.
Public/Granted literature
- US20180247824A1 ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION Public/Granted day:2018-08-30
Information query
IPC分类: