Invention Grant
- Patent Title: Manufacturing method of semiconductor package
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Application No.: US15951930Application Date: 2018-04-12
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Publication No.: US10312209B2Publication Date: 2019-06-04
- Inventor: Chao-Wen Shih , Kai-Chiang Wu , Ching-Feng Yang , Ming-Kai Liu , Shih-Wei Liang , Yen-Ping Wang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/00 ; H01L23/31 ; H01L23/29 ; H01L21/56

Abstract:
The present disclosure provides a semiconductor package, which includes a substrate, a passivation layer, a post-passivation interconnect (PPI) having a top surface; and a conductive structure. The top surface of the PPI includes a first region receiving the conductive structure, and a second region surrounding the first region. The second region includes metal derivative transformed from materials made of the first region. The present disclosure provide a method of manufacturing a semiconductor package, including forming a first flux layer covering a portion of a top surface of a PPI; transforming a portion of the top surface of the PPI uncovered by the first flux layer into a metal derivative layer; removing the first flux layer; forming a second flux layer on the first region of the PPI; dropping a solder ball on the flux layer; and forming electrical connection between the solder ball and the PPI.
Public/Granted literature
- US20180233472A1 MANUFACTURING METHOD OF SEMICONDUCTOR PACKAGE Public/Granted day:2018-08-16
Information query
IPC分类: