Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15505508Application Date: 2015-09-16
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Publication No.: US10312233B2Publication Date: 2019-06-04
- Inventor: Katsutoshi Sugawara , Yasuhiro Kagawa , Rina Tanaka , Yutaka Fukui
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Chiyoda-ku
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-199781 20140930
- International Application: PCT/JP2015/076318 WO 20150916
- International Announcement: WO2016/052203 WO 20160407
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/02 ; H01L29/78 ; H01L29/06 ; H01L29/417 ; H01L29/16 ; H01L21/04 ; H01L29/10 ; H01L29/739

Abstract:
A semiconductor device includes a base region of second conductivity type formed on a drift layer of first conductivity type, a source region of first conductivity type located in the base region, a trench passing through the base region and the source region and dividing cell regions in plan view, a protective diffusion layer of second conductivity type disposed on a bottom of the trench, a gate electrode embedded in the trench with a gate insulating film therebetween, a source electrode electrically connected to the source region, and a protective contact region disposed at each of positions of three or more cell regions and connecting the protective diffusion layer and the source electrode to each other. The protective contact regions are disposed such that a triangle whose vertices are centers of three protective contact regions located closest to one another is an acute triangle.
Public/Granted literature
- US20170271323A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-09-21
Information query
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