Invention Grant
- Patent Title: Array substrate assembly and method of manufacturing the same
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Application No.: US15766140Application Date: 2017-09-19
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Publication No.: US10312270B2Publication Date: 2019-06-04
- Inventor: Zhilian Xiao , Haisheng Zhao , Hongxi Xiao , Xiaoguang Pei , Chong Liu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Kinney & Lange, P.A.
- Priority: CN201710086972 20170217
- International Application: PCT/CN2017/102280 WO 20170919
- International Announcement: WO2018/149129 WO 20180823
- Main IPC: H01L27/12
- IPC: H01L27/12

Abstract:
A method of manufacturing an array substrate assembly and an array substrate assembly manufactured by the method are disclosed. The method includes: manufacturing a gate metal layer on a substrate, the gate metal layer including a gate line and a common electrode signal line spaced from each other; forming a gate insulating layer, an active layer, a source-drain electrode layer, a passivation layer, and a protective pattern on the gate metal layer; and forming, in the passivation layer and the gate insulating layer, a via hole configured for a connection to the common electrode signal line. An orthogonal projection of the protective pattern on the substrate and an orthogonal projection of the via hole on the substrate partly coincide with each other, and the orthogonal projection of the protective pattern on the substrate and an orthogonal projection of the gate line on the substrate partly coincide with each other.
Public/Granted literature
- US20190123067A1 ARRAY SUBSTRATE ASSEMBLY AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-04-25
Information query
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