Invention Grant
- Patent Title: Epitaxial wafer for hetero-junction bipolar transistor and hetero-junction bipolar transistor
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Application No.: US15561345Application Date: 2016-01-12
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Publication No.: US10312324B2Publication Date: 2019-06-04
- Inventor: Takeshi Meguro , Shinjiro Fujio
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-064409 20150326
- International Application: PCT/JP2016/050697 WO 20160112
- International Announcement: WO2016/152195 WO 20160929
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L29/737 ; H01L29/66 ; H01L29/207 ; H01L29/20

Abstract:
An epitaxial wafer for a heterojunction bipolar transistor and a heterojunction bipolar transistor capable of reducing the resistance of the sub-collector layer without reducing the current amplification factor are provided. In an epitaxial wafer for a heterojunction bipolar transistor including a sub-collector layer made of n-type GaAs, the sub-collector layer contains n-type impurities having a covalent radius that is smaller than the covalent radius of the substitution site and n-type impurities having a covalent radius that is larger than the covalent radius of the substitution site.
Public/Granted literature
- US20180061948A1 EPITAXIAL WAFER FOR HETERO-JUNCTION BIPOLAR TRANSISTOR AND HETERO-JUNCTION BIPOLAR TRANSISTOR Public/Granted day:2018-03-01
Information query
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