Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15728141Application Date: 2017-10-09
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Publication No.: US10312339B2Publication Date: 2019-06-04
- Inventor: Saichirou Kaneko , Hiroto Yamagiwa , Ayanori Ikoshi , Masayuki Kuroda , Manabu Yanagihara , Kenichiro Tanaka , Tetsuyuki Fukushima
- Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2013-092347 20130425
- Main IPC: H01L29/47
- IPC: H01L29/47 ; H01L21/28 ; H01L29/872 ; H01L29/778 ; H01L29/06 ; H01L29/20 ; H01L29/205 ; H01L29/10 ; H01L29/423

Abstract:
In a semiconductor device in the present disclosure, a first nitride semiconductor layer has a two-dimensional electron gas channel in a vicinity of an interface with a second nitride semiconductor layer. In plan view, an electrode portion is provided between a first electrode and a second electrode with a space between the first electrode and the second electrode, and a space between the second electrode and the electrode portion is smaller than the space between the first electrode and the electrode portion. An energy barrier is provided in a junction surface between the electrode portion and the second nitride semiconductor layer, the energy barrier indicating a rectifying action in a forward direction from the electrode portion to the second nitride semiconductor layer, and a bandgap of the second nitride semiconductor layer is wider than a bandgap of the first nitride semiconductor layer.
Public/Granted literature
- US20180040706A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-02-08
Information query
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