Invention Grant
- Patent Title: P-type diffusion layer forming composition
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Application No.: US14262719Application Date: 2014-04-26
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Publication No.: US10312402B2Publication Date: 2019-06-04
- Inventor: Youichi Machii , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuichiro Adachi
- Applicant: HITACHI CHEMICAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Seyfarth Shaw LLP
- Priority: JP2011-005312 20110113
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0224 ; H01L21/22 ; H01L21/225
Abstract:
The composition for forming a p-type diffusion layer in accordance with the present invention contains an acceptor element-containing glass powder and a dispersion medium. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.
Public/Granted literature
- US20140227821A1 P-TYPE DIFFUSION LAYER FORMING COMPOSITION Public/Granted day:2014-08-14
Information query
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