Invention Grant
- Patent Title: Non-volatile memory devices, RRAM devices and methods for fabricating RRAM devices with magnesium oxide insulator layers
-
Application No.: US15711370Application Date: 2017-09-21
-
Publication No.: US10312442B2Publication Date: 2019-06-04
- Inventor: Danny Pak-Chum Shum , Desmond Jia Jun Loy , Wen Siang Lew
- Applicant: Globalfoundries Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: Globalfoundries Singapore Pte. Ltd.
- Current Assignee: Globalfoundries Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Lorenz & Kopf, LLP
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L45/00 ; H01L27/24

Abstract:
Non-volatile memory (NVM) devices, resistive random access memory (RRAM) devices and methods for fabricating such devices are provided. In an exemplary embodiment, a non-volatile memory (NVM) device includes a first electrode and a second electrode positioned above the first electrode. Further, the NVM device includes a variable resistance material layer positioned between the first electrode and the second electrode. The variable resistance material layer contains magnesium oxide.
Public/Granted literature
Information query
IPC分类: