Invention Grant
- Patent Title: Manufacturing method of circuit structure
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Application No.: US16013956Application Date: 2018-06-21
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Publication No.: US10314179B2Publication Date: 2019-06-04
- Inventor: Hung-Lin Chang , Ming-Hao Wu , Syun-Siao Chang , Cheng-Po Yu , Chi-Min Chang
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: JCIPRNET
- Priority: TW104140604A 20151203
- Main IPC: H05K3/46
- IPC: H05K3/46

Abstract:
A manufacturing method of a circuit board structure is described as follows. An inner circuit structure including a core layer having an upper and an opposite lower surface, a first patterned circuit layer disposed on the upper surface and a second patterned circuit layer disposed on the lower surface is provided. An insulating material layer is formed on a portion of the first patterned circuit layer. A laser resisting layer is formed on at least a portion of the insulating material layer. A release layer is adhered to the laser resisting layer. A build-up process is performed so as to laminate a first and a second build-up circuit structures on the first and the second patterned circuit layers, respectively. A laser ablation process is performed on the first build-up circuit structure so as to form a cavity at least exposing a portion of the upper surface of the core layer.
Public/Granted literature
- US20180302992A1 MANUFACTURING METHOD OF CIRCUIT STRUCTURE Public/Granted day:2018-10-18
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