The invention provides a vacuum evaporation device, belongs to the field of vacuum evaporation and can solve the problem of non-uniform thickness of a coating film formed by an existing vacuum evaporation device. The vacuum evaporation device provided by the present invention comprises an evaporation chamber, at least one evaporation source device disposed in the evaporation chamber, and a baffle assembly disposed between the evaporation source device and a substrate to be evaporated. The evaporation source device is disposed within the center region of a base plate of the evaporation chamber. The baffle assembly is provided with a baffle assembly opening used for allowing evaporation substances to pass therethrough and corresponding to the position of the evaporation source device. As the evaporation source device is disposed within the center region of the evaporation chamber, the thickness of a coating film formed on the surface of the substrate is more uniform.