Invention Grant
- Patent Title: Method and device for inspecting spatial light modulator, and exposure method and device
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Application No.: US14241951Application Date: 2012-08-30
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Publication No.: US10317346B2Publication Date: 2019-06-11
- Inventor: Tomoharu Fujiwara
- Applicant: Tomoharu Fujiwara
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JPP2011-191319 20110902
- International Application: PCT/JP2012/072025 WO 20120830
- International Announcement: WO2013/031901 WO 20130307
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G01N21/95 ; G02B26/06 ; G03F7/20 ; G06T7/00 ; G01N21/55

Abstract:
A method for inspecting a spatial light modulator includes: performing such control that in an inspection target area in an array of mirror elements, the mirror elements in a first state in which incident light is given a phase change amount of 0 and the mirror elements in a second state in which incident light is given a phase change amount of 180° (π) become arrayed in a checkered pattern; guiding light having passed the inspection target area to a projection optical system with a resolution limit coarser than a width of an image of one mirror element, to form a spatial image; and inspecting a characteristic of the spatial light modulator from the spatial image. This method allows us to readily perform the inspection of the characteristic of the spatial light modulator having the array of optical elements.
Public/Granted literature
- US20140320835A1 METHOD AND DEVICE FOR INSPECTING SPATIAL LIGHT MODULATOR, AND EXPOSURE METHOD AND DEVICE Public/Granted day:2014-10-30
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