- Patent Title: Geometric control of bottom-up pillars for patterning applications
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Application No.: US15805753Application Date: 2017-11-07
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Publication No.: US10319591B2Publication Date: 2019-06-11
- Inventor: Ziqing Duan , Abhijit Basu Mallick
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/033
- IPC: H01L21/033 ; H01L21/3105 ; H01L21/311 ; H01L21/321 ; H01L21/768
Abstract:
Processing methods comprising selectively replacing a first pillar material with a second pillar material in a self-aligned process are described. The first pillar material may be grown orthogonally to the substrate surface and replaced with a second pillar material to leave a substantially similar shape and alignment as the first pillar material.
Public/Granted literature
- US20180130657A1 Geometric Control Of Bottom-Up Pillars For Patterning Applications Public/Granted day:2018-05-10
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