Invention Grant
- Patent Title: Methods for self-aligned patterning
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Application No.: US15805764Application Date: 2017-11-07
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Publication No.: US10319604B2Publication Date: 2019-06-11
- Inventor: Ziqing Duan , Yihong Chen , Abhijit Basu Mallick , Srinivas Gandikota
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/321 ; H01L21/311 ; H01L21/3205 ; H01L21/02 ; H01L21/285 ; H01L21/3213
Abstract:
Processing methods comprising depositing a film on a substrate surface and in a surface feature with chemical planarization to remove the film from the substrate surface, leaving the film in the feature. A pillar is grown from the film so that the pillar grows orthogonally to the substrate surface.
Public/Granted literature
- US20180130671A1 Methods For Self-Aligned Patterning Public/Granted day:2018-05-10
Information query
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