- Patent Title: Aberration-correction method, laser processing method using said aberration-correcting method, laser irradiation method using said aberration-correcting method, aberration-correcting device and aberration-correcting program
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Application No.: US15290233Application Date: 2016-10-11
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Publication No.: US10324285B2Publication Date: 2019-06-18
- Inventor: Haruyasu Ito , Naoya Matsumoto , Takashi Inoue
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2008-223582 20080901; JP2009-125759 20090525
- Main IPC: B23K26/03
- IPC: B23K26/03 ; G02B21/00 ; G02B5/18 ; B23K26/00 ; B23K26/06 ; B23K26/36 ; B23K26/38 ; B23K26/40 ; B23K26/53 ; B23K26/57 ; G02B21/02 ; G02B21/06 ; G02B21/36 ; G02B27/00 ; B23K26/064 ; B23K26/364 ; G02B5/32 ; G02F1/01 ; B23K101/40 ; B23K103/00

Abstract:
In an aberration-correcting method according to an embodiment of the present invention, in an aberration-correcting method for a laser irradiation device 1 which focuses a laser beam on the inside of a transparent medium 60, aberration of a laser beam is corrected so that a focal point of the laser beam is positioned within a range of aberration occurring inside the medium. This aberration range is not less than n×d and not more than n×d+Δs from an incidence plane of the medium 60, provided that the refractive index of the medium 60 is defined as n, a depth from an incidence plane of the medium 60 to the focus of the lens 50 is defined as d, and aberration caused by the medium 60 is defined as Δs.
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