Invention Grant
- Patent Title: Semiconductor devices and methods of manufacturing the same
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Application No.: US15222614Application Date: 2016-07-28
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Publication No.: US10332785B2Publication Date: 2019-06-25
- Inventor: Yong Hyun Lim
- Applicant: SK hynix Inc.
- Applicant Address: KR Gyeonggi-do
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2012-0067392 20120622
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/311 ; H01L23/528 ; H01L27/11575 ; H01L27/11582 ; H01L27/105 ; H01L23/50 ; H01L27/1157 ; H01L23/522

Abstract:
A semiconductor device includes a substrate including a memory cell region and a contact region, a string structure including conductive layers and first interlayer insulating layers alternately stacked over the substrate and protruded toward a lower layer from the memory cell region toward the contact region, barrier rib patterns spaced apart from one another over the conductive layers in the contact region and configured to open the layers of the conductive layers in the contact region through the spaced spaces, and first contact plugs filled into the space between barrier rib patterns adjacent to each other and coupled to the conductive layers in the contact region.
Public/Granted literature
- US20160336220A1 SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2016-11-17
Information query
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