Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15947933Application Date: 2018-04-09
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Publication No.: US10332852B2Publication Date: 2019-06-25
- Inventor: Naoya Take
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Applicant Address: JP Toyota-shi, Aichi-ken
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota-shi, Aichi-ken
- Agency: Sughrue Mion, PLLC
- Priority: JP2017-083043 20170419
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
A semiconductor device may include a semiconductor substrate, a first bonding pad provided on an upper surface of the semiconductor substrate and constituted of a metal including aluminum, a second bonding pad provided on the upper surface of the semiconductor substrate, and a first protrusion protruding from an upper surface of the first bonding pad. The first protrusion may be provided on the upper surface of the first bonding pad only at a position adjacent to a peripheral edge of the first bonding pad, the peripheral edge of the first bonding pad may be opposed to the second bonding pad.
Public/Granted literature
- US20180308814A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-10-25
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