Invention Grant
- Patent Title: Hall element for 3-D sensing and method for producing the same
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Application No.: US15661826Application Date: 2017-07-27
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Publication No.: US10333056B2Publication Date: 2019-06-25
- Inventor: Bin Liu , Eng Huat Toh , Ruchil Kumar Jain
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Current Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Current Assignee Address: SG Singapore
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: G01R33/00
- IPC: G01R33/00 ; G01R33/02 ; G01R33/07 ; H01L43/04 ; H01L43/06 ; H01L43/14 ; H01L27/22

Abstract:
A method of forming a 3D Hall effect sensor and the resulting device are provided. Embodiments include forming a p-type well in a substrate; forming a first n-type well in a first region surrounded by the p-type well in top view; forming a second n-type well in a second region surrounding the p-type well; providing n-type dopant in the first and second n-type wells; and providing p-type dopant in the p-type well and the first n-type well.
Public/Granted literature
- US20190036011A1 HALL ELEMENT FOR 3-D SENSING AND METHOD FOR PRODUCING THE SAME Public/Granted day:2019-01-31
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