A vapor deposition apparatus disclosed in an embodiment is configured to allow an electromagnet (3) to attract a vapor deposition mask, and comprises a control circuit (7) connected between the electromagnet (3) and a power supply circuit (6) for driving the electromagnet (3). The control circuit gradually changes a magnetic field to be generated by the electromagnet (3) when a current is applied to the electromagnet (3). As a result, the change in current to flow in an electromagnetic coil (32) of the electromagnet (3) becomes gradual and an effect of electromagnetic induction is reduced, thereby suppressing the defect of elements formed on a substrate for vapor deposition or the deterioration in property of the element.