Invention Grant
- Patent Title: Method for automatic calibration of a device for generative production of a three-dimensional object
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Application No.: US14888969Application Date: 2014-05-08
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Publication No.: US10336008B2Publication Date: 2019-07-02
- Inventor: Hans Perret , Jochen Philippi
- Applicant: EOS GmbH Electro Optical Systems
- Applicant Address: DE Krailling
- Assignee: EOS GMBH ELECTRO OPTICAL SYSTEMS
- Current Assignee: EOS GMBH ELECTRO OPTICAL SYSTEMS
- Current Assignee Address: DE Krailling
- Agency: Seyfarth Shaw LLP
- Priority: DE102013208651 20130510
- International Application: PCT/EP2014/059502 WO 20140508
- International Announcement: WO2014/180971 WO 20141113
- Main IPC: B29C64/393
- IPC: B29C64/393 ; B29C67/00 ; G05B19/401 ; B22F3/105 ; B29C64/153 ; B29C64/386 ; B29C64/277 ; B33Y10/00 ; B33Y30/00 ; B33Y50/02 ; B29K105/00

Abstract:
A method for automatically calibrating a device for generatively producing a three-dimensional object (8) comprises the following steps: irradiating an applied layer of a material (3) or a target by means of a first scanner (14) in order to produce a first test pattern (33) in the material (3) or the target; irradiating the applied layer of the material (3) or the target by means of a second scanner (15) in order to produce a second test pattern (34) in the material (3) or the target; detecting the first and second test patterns (33, 34) by means of a camera (24) and assigning the first and second test patterns (33, 34) to the first and second scanners (14, 15), respectively; comparing the first and/or the second test pattern (33, 34) with a reference pattern and/or comparing the first and second test patterns (33, 34) with one another; determining a first deviation of the first test pattern (33) from the reference pattern and/or a second deviation of the second test pattern (34) from the reference pattern and/or a relative deviation between the first test pattern (33) and the second test pattern (34); and calibrating the first and/or the second scanner (14, 15) in such a way that the first and/or the second deviation from the reference pattern and/or the relative deviation between the first test pattern (33) and the second test pattern (34) falls below a setpoint value.
Public/Granted literature
- US20160082668A1 Method for Automatic Calibration of a Device for Generative Production of a Three-Dimensional Object Public/Granted day:2016-03-24
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