Invention Grant
- Patent Title: Photocurable resin composition for forming support regions
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Application No.: US15125589Application Date: 2015-03-25
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Publication No.: US10336052B2Publication Date: 2019-07-02
- Inventor: Jan-Michael Stepper , Tsuneo Hagiwara
- Applicant: I-SQUARED GmbH
- Applicant Address: CH Lengwil-Oberhofen
- Assignee: ISQUARED GmbH
- Current Assignee: ISQUARED GmbH
- Current Assignee Address: CH Lengwil-Oberhofen
- Agency: Davis & Bujold PLLC
- Agent Michael J. Bujold
- Priority: JP2014-061175 20140325
- International Application: PCT/EP2015/056403 WO 20150325
- International Announcement: WO2015/144761 WO 20151001
- Main IPC: B33Y40/00
- IPC: B33Y40/00 ; C08F220/58 ; C08L33/14 ; C08F2/48 ; B33Y70/00 ; B33Y10/00 ; B29C64/112 ; B29C64/40 ; C08F220/28 ; C08F220/36 ; B29C64/124

Abstract:
A photocurable resin composition for support regions for use in photochemical fabrication by an inkjet method, which has low viscosity and outstanding photocurability, and where the support regions, formed by the photocuring, have good supporting performance and, following the end of the photochemical fabrication, can readily be removed from the main body by dissolving in water and/or by a weak external force such as a water jet. The photocurable resin composition for support regions for use in photochemical 3D fabrication by the inkjet method contains, based on the total mass of photocurable resin composition, from 2 to 20 mass % of N-hydroxyalkyl (meth) acrylamide, from 2 to 20 mass % of (meth) acryloyl morpholine, from 3 to 30 mass % of (meth) acrylate compound having at least one (meth) acryloyloxy group, from 40 to 90 mass % of polyhydroxy compound containing two or more hydroxyl groups, and from 0.1 to 5 mass % of a photo-radical polymerization initiator.
Public/Granted literature
- US20170001382A1 PHOTOCURABLE RESIN COMPOSITION FOR FORMING SUPPORT REGIONS Public/Granted day:2017-01-05
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