Invention Grant
- Patent Title: High purity cobalt chloride and manufacturing method therefor
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Application No.: US14906774Application Date: 2014-09-05
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Publication No.: US10337109B2Publication Date: 2019-07-02
- Inventor: Gaku Kanou
- Applicant: JX Nippon Mining & Metals Corporation
- Applicant Address: JP Tokyo
- Assignee: JX NIPPON MINIG & METALS CORPORATION
- Current Assignee: JX NIPPON MINIG & METALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Howson & Howson LLP
- Priority: JP2013-249184 20131202
- International Application: PCT/JP2014/073479 WO 20140905
- International Announcement: WO2015/083406 WO 20150611
- Main IPC: C25B1/26
- IPC: C25B1/26 ; C01G51/08 ; C25B11/04 ; C25B9/08

Abstract:
Provided is high purity cobalt chloride having a purity of 5N (99.999%) or higher, and a manufacturing method of the high purity cobalt chloride via electrolysis, wherein cobalt having a purity of 5N or higher is used as an anode, a diluted hydrochloric acid bath having a pH of 1.5 to 3.0 is used as an electrolytic solution, the cobalt anode and a cathode plate are partitioned with an anion exchange membrane, and electrodeposition of the cobalt onto the cathode plate is thereby inhibited. An object of this invention is to provide a manufacturing method capable of providing high purity cobalt chloride at a higher purity and at a lower production cost than conventional methods. Under circumstances where demands for cobalt chloride may increase, cobalt chloride needs to be manufactured at high volume and at low cost, and the present invention offers a technique capable of satisfying the foregoing requirements.
Public/Granted literature
- US20160168728A1 HIGH PURITY COBALT CHLORIDE AND MANUFACTURING METHOD THEREFOR Public/Granted day:2016-06-16
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