Invention Grant
- Patent Title: Device and method for forming same
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Application No.: US15508072Application Date: 2014-09-11
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Publication No.: US10338057B2Publication Date: 2019-07-02
- Inventor: Itaru Yanagi , Kenichi Takeda
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Procopio, Cory, Hargreaves & Savitch LLP
- International Application: PCT/JP2014/074063 WO 20140911
- International Announcement: WO2016/038719 WO 20160317
- Main IPC: G01N27/447
- IPC: G01N27/447 ; G01N33/487 ; G01N27/327 ; B82B1/00 ; B82B3/00 ; C12Q1/6869 ; B81C1/00 ; B82Y5/00 ; B82Y40/00

Abstract:
The membrane of a conventional solid-state nanopore device, which is believed to be promising for understanding the structural characteristics of DNA and determining a nucleotide sequence, has been thick, and the accuracy in determining a nucleotide sequence in the DNA chain has been insufficient. A method characterized by forming a membrane by forming a first film on a first substrate having a surface of Si, then forming a hole in the first film in such a manner that the surface of the first substrate is exposed, then forming a second film on the first film and on the surface of the first substrate and then etching the first substrate with a solution which does not remove the second film.
Public/Granted literature
- US20170307587A1 DEVICE AND METHOD FOR FORMING SAME Public/Granted day:2017-10-26
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