Invention Grant
- Patent Title: Photosensitive resin composition, photosensitive resin laminate, resin pattern production method, cured film, and display device
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Application No.: US15510619Application Date: 2015-09-24
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Publication No.: US10338468B2Publication Date: 2019-07-02
- Inventor: Mayuki Yoshida , Satoshi Shibui
- Applicant: ASAHI KASEI KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: ASAHI KASEI KABUSHIKI KAISHA
- Current Assignee: ASAHI KASEI KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-194059 20140924
- International Application: PCT/JP2015/076940 WO 20150924
- International Announcement: WO2016/047691 WO 20160331
- Main IPC: G06F3/041
- IPC: G06F3/041 ; G03F7/033 ; G03F7/027 ; G03F7/031 ; G03F7/038 ; G03F7/09 ; G03F7/20 ; G03F7/32

Abstract:
The present invention provides a photosensitive resin laminate in which (A) an alkali-soluble polymer, (B) a compound having an ethylenically unsaturated double bond, and (C) a photosensitive resin layer including a photopolymerization initiator are laminated on a support film. The photosensitive resin laminate is used in forming the protective film of a conductor part, the thickness of the photosensitive resin is 20 μm or less, and the cured product of the photosensitive resin layer satisfies conditions (1) to (3): (1) the crosslink density is 1,000 mol/m3-8,000 mol/m3; (2) the peak top value of Tan δ is 0.4 or greater; and (3) the refractive index at a wavelength of 532 nm is 1.50-1.60.
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