- Patent Title: Method and system for forming a patterned structure on a substrate
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Application No.: US15032950Application Date: 2014-10-29
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Publication No.: US10338473B2Publication Date: 2019-07-02
- Inventor: Rob Jacob Hendriks , Gari Arutinov , Edsger Constant Pieter Smits
- Applicant: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Applicant Address: NL 's-Gravenhage
- Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee Address: NL 's-Gravenhage
- Agency: Banner & Witcoff, Ltd.
- Priority: EP13190956 20131030; EP13197502 20131216
- International Application: PCT/NL2014/050748 WO 20141029
- International Announcement: WO2015/065182 WO 20150507
- Main IPC: G03F7/20
- IPC: G03F7/20 ; B41M3/00 ; B41M5/46

Abstract:
The present disclosure concerns a method and system for providing a patterned structure (3p) on an acceptor substrate 4). The method comprises providing a donor substrate (10) arranged between a light source (5) and an acceptor substrate (4). A mask (7) is arranged between the light source (5) and the donor substrate (10). The mask (7) comprises a mask pattern (7p) for patterning light (6). The patterned light (6p) impinging the donor substrate (10) causes the donor material (3) to be released from the donor substrate (10) and transfer to the acceptor substrate (4) to form the patterned structure (3p) thereon. The patterned light (6p) is divided by the mask pattern (7p) into a plurality of separate homogeneously sized beams (6b) simultaneously impinging the donor substrate (10) for causing the donor material (3) to be released from the donor substrate (10) in the form of separate homogeneously sized droplets (3d).
Public/Granted literature
- US20160259250A1 METHOD AND SYSTEM FOR FORMING A PATTERNED STRUCTURE ON A SUBSTRATE Public/Granted day:2016-09-08
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