Invention Grant
- Patent Title: Apparatus, method and nontransitory computer readable medium for manufacturing integrated circuit device
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Application No.: US14846109Application Date: 2015-09-04
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Publication No.: US10340128B2Publication Date: 2019-07-02
- Inventor: Hiroyuki Yazawa
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; H01J37/32 ; H01L27/11568 ; H01L21/67 ; H01L27/11582 ; H01L21/311 ; H01L49/02
Abstract:
According to one embodiment, a manufacturing apparatus for an integrated circuit device includes an etching treatment unit, a sensor, and a control unit. The etching treatment unit etches a stacked body including an alternately arranged plurality of films having different compositions. The sensor detects light intensity in the etching. The control unit acquires data concerning a temporal change in the light intensity detected by the sensor and performs control of the etching based on a time interval of a plurality of extreme values of the data.
Public/Granted literature
- US20170018469A1 APPARATUS, METHOD AND NONTRANSITORY COMPUTER READABLE MEDIUM FOR MANUFACTURING INTEGRATED CIRCUIT DEVICE Public/Granted day:2017-01-19
Information query
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