Invention Grant
- Patent Title: Semiconductor structure multilayers having a dusting material at an interface between a non-magnetic layer and a magnetic layer
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Application No.: US15913145Application Date: 2018-03-06
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Publication No.: US10340446B1Publication Date: 2019-07-02
- Inventor: Matthias Georg Gottwald
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Ryan, Mason & Lewis, LLP
- Agent Vazken Alexanian
- Main IPC: G11C11/16
- IPC: G11C11/16 ; H01L43/08 ; H01L27/22 ; H01L43/02 ; H01L43/10 ; H01L43/12 ; G11C11/15

Abstract:
A semiconductor structure includes a seed layer and a multilayer stack of one or more multilayers disposed over the seed layer, each of the one or more multilayers including a magnetic layer and an additional layer disposed over a top surface of the magnetic layer. The additional layer includes a non-magnetic material and a dusting material. The multilayer stack provides a reference layer of a perpendicular magnetic tunnel junction stack. The magnetic layer may be formed of cobalt, the non-magnetic material may be at least one of iridium and rhodium, and the dusting material may be at least one of platinum, ruthenium, palladium, gold and nickel.
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