Invention Grant
- Patent Title: Polyether-based polymer composition
-
Application No.: US15553305Application Date: 2016-02-26
-
Publication No.: US10344124B2Publication Date: 2019-07-09
- Inventor: The Ban Hoang , Keisuke Ohta , Shigetaka Hayano , Yasuo Tsunogae
- Applicant: ZEON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: ZEON CORPORATION
- Current Assignee: ZEON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2015-038137 20150227
- International Application: PCT/JP2016/055846 WO 20160226
- International Announcement: WO2016/136951 WO 20160901
- Main IPC: C08K3/04
- IPC: C08K3/04 ; C01B32/05 ; C08G65/08 ; C08L71/02 ; G01N30/00 ; G01R33/46

Abstract:
The present invention is a polyether-based polymer composition includes: a polyether-based polymer including an oxirane monomer unit and having one cationic group substantially only at one terminal of a polymer chain, and a nanocarbon material. The polyether-based polymer composition of the present invention can be suitably used, for example, as a bucky gel or as a master batch for preparing a nanocarbon material aqueous dispersion in which a nanocarbon material is favorably dispersed.
Public/Granted literature
- US20180016391A1 POLYETHER-BASED POLYMER COMPOSITION Public/Granted day:2018-01-18
Information query