Invention Grant
- Patent Title: Under layer film-forming composition for imprints and method for forming pattern
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Application No.: US14860767Application Date: 2015-09-22
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Publication No.: US10344177B2Publication Date: 2019-07-09
- Inventor: Hirotaka Kitagawa , Yuichiro Enomoto
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2013-063380 20130326
- Main IPC: C09D151/08
- IPC: C09D151/08 ; G03F7/00 ; G03F7/038 ; G03F7/11 ; B29C59/00 ; C09D151/00 ; B29K63/00 ; B29K96/02
Abstract:
Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.
Public/Granted literature
- US20160009946A1 UNDER LAYER FILM-FORMING COMPOSITION FOR IMPRINTS AND METHOD FOR FORMING PATTERN Public/Granted day:2016-01-14
Information query
IPC分类:
